| 摘要 |
<P>PROBLEM TO BE SOLVED: To control the temperature of a reticle. <P>SOLUTION: Clearance between the top face of a reticle R and a temperature controller 86<SB POS="POST">1</SB>is adjusted during movement of a reticle stage RST holding the reticle R in the scanning direction by controlling a temperature controller drive system based on the measurement results from gap sensors 87<SB POS="POST">1</SB>, 87<SB POS="POST">2</SB>, thereby adjusting the clearance and inclination of the temperature controller 86<SB POS="POST">1</SB>for the reticle R. While controlling the temperature of the reticle R by using the temperature controller without bringing the temperature controller 86<SB POS="POST">1</SB>into contact with the reticle R, a pattern is transferred onto a wafer by using that reticle R. <P>COPYRIGHT: (C)2012,JPO&INPIT |
