发明名称 VERTICAL CAPACITORS FORMED ON SEMICONDUCTING SUBSTRATES
摘要 Semiconductor devices (100) and methods of making the same. Each of the semiconductor devices includes a substrate (102) having a first surface (118) and an opposing second surface. A vertical capacitive element (104) is disposed on the first surface of the substrate. The vertical capacitive element comprises a plurality of parallel conductive plates (120b, 120d, 120f, 120h, 120j, 120l, 120n) extending transverse to the first surface of the substrate. Adjacent conductive plates are spaced a distance D from each other. A dielectric material (104) can be disposed in a space separating the adjacent conductive plates. Each of the conductive plates has a height-to-width (h/w) ratio greater than or equal to one.
申请公布号 US2012032302(A1) 申请公布日期 2012.02.09
申请号 US20100850400 申请日期 2010.08.04
申请人 SMITH DAVID M.;HARRIS CORPORATION 发明人 SMITH DAVID M.
分类号 H01L29/92;H01L21/02 主分类号 H01L29/92
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