| 摘要 |
<P>PROBLEM TO BE SOLVED: To avoid necessity of management of rotation direction and/or reduction in the visibility of pattern after rotation relating to a rotation operation in layout of process marks formed in a scribe region. <P>SOLUTION: The graphic data creation method for process marks includes a step in which at least one element graphic 620 is extracted from a tentative process mark 605 including predetermined element graphics 610 and 620. The method further includes a step in which a reference process mark 600 having a double rotational symmetry with respect to a rotation center 600c is created by adding another element graphic 630, in which the extracted element graphic 620 is rotated by, for example, 180° on the rotation center 600c, to the tentative process mark 605. Also, in place of 180°, the element graphic 620 may be rotated by 90°, and after rotating the reference process mark by 90°, an element graphic which faces in an identical direction of the element graphic 620 before the rotation operation may be added. <P>COPYRIGHT: (C)2012,JPO&INPIT |
