发明名称 POSITION CONTROL SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD TO CONTROL POSITION OF MOVABLE OBJECT
摘要 <P>PROBLEM TO BE SOLVED: To provide a position control system and/or a method for a movable object of a lithographic apparatus which can increase the accuracy and/or speed of position control of the movable object. <P>SOLUTION: A position control system to control the position of a movable object includes a position measurement system configured to determine an actual position related quantity of the movable object; a set-point generator to provide a position related set-point signal of the movable object; a comparator to provide an error signal on the basis of a comparison of the actual position related quantity and the position related set-point signal; a controller to provide a control signal on the basis of the error signal; a feed-forward device to provide a feed-forward signal on the basis of the position related set-point signal; and one or more actuators to act on the movable object on the basis of the control signal and the feed-forward signal. The feed-forward device includes a disturbance force correction table including estimated values of disturbance forces exerted on the movable object in dependence upon a position of the movable object. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012028784(A) 申请公布日期 2012.02.09
申请号 JP20110162948 申请日期 2011.07.26
申请人 ASML NETHERLANDS BV 发明人 WILHELMUS FRANCISCUS JOHANNES SIMONS;VAN DEN NEWWELLER NORBERTUS JOSEPHUS MARIA;HEERTJES MARCEL FRANCOIS;GELIS JOST JOSEPH HENDRIK;HENDRIK FERDINAND BERNARD WILHELMS MARIA
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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