发明名称 |
POSITION CONTROL SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD TO CONTROL POSITION OF MOVABLE OBJECT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a position control system and/or a method for a movable object of a lithographic apparatus which can increase the accuracy and/or speed of position control of the movable object. <P>SOLUTION: A position control system to control the position of a movable object includes a position measurement system configured to determine an actual position related quantity of the movable object; a set-point generator to provide a position related set-point signal of the movable object; a comparator to provide an error signal on the basis of a comparison of the actual position related quantity and the position related set-point signal; a controller to provide a control signal on the basis of the error signal; a feed-forward device to provide a feed-forward signal on the basis of the position related set-point signal; and one or more actuators to act on the movable object on the basis of the control signal and the feed-forward signal. The feed-forward device includes a disturbance force correction table including estimated values of disturbance forces exerted on the movable object in dependence upon a position of the movable object. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012028784(A) |
申请公布日期 |
2012.02.09 |
申请号 |
JP20110162948 |
申请日期 |
2011.07.26 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
WILHELMUS FRANCISCUS JOHANNES SIMONS;VAN DEN NEWWELLER NORBERTUS JOSEPHUS MARIA;HEERTJES MARCEL FRANCOIS;GELIS JOST JOSEPH HENDRIK;HENDRIK FERDINAND BERNARD WILHELMS MARIA |
分类号 |
H01L21/027;G03F7/20;H01L21/68 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|