| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect detection device for detecting a defect with a simple method by setting a proper mask area. <P>SOLUTION: To accomplish the object, the defect detection device is provided, which expands pattern line segments of simulation image data of a semiconductor circuit, applies a mask to one between a pattern inner area and an outer area of the simulation image data, detects a luminance signal of an SEM image about the masked simulation image data and an area other than the masked area, and determines the existence/absence of a part where a luminance change exceeds a prescribed value, or extracts position information of the part where the luminance change exceeds the prescribed value. <P>COPYRIGHT: (C)2012,JPO&INPIT |
