| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound semiconductor manufacturing apparatus capable of reducing frequency of replacing a filter cartridge clogged due to repetition of epitaxial growth. <P>SOLUTION: The compound semiconductor manufacturing apparatus includes a reactor 2 for growing a compound semiconductor crystal on a substrate 5 by vapor-phase epitaxy and a trap 12 for collecting compounds produced in the reactor 2, and the trap 12 is connected to the reactor 2. In the compound semiconductor manufacturing apparatus, movable filter cartridges 15a, 15b, and 15c are provided in multiple tiers in a trap body 18. <P>COPYRIGHT: (C)2012,JPO&INPIT |
