RADIO FREQUENCY (RF) POWER FILTERS AND PLASMA PROCESSING SYSTEMS INCLUDING RF POWER FILTERS
摘要
A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.
申请公布号
WO2012018670(A2)
申请公布日期
2012.02.09
申请号
WO2011US45722
申请日期
2011.07.28
申请人
LAM RESEARCH CORPORATION;LONG, MAOLIN;LU, RALPH;EGLEY, FRED;ANDERSON, THOMAS;JAFARIAN-TEHRANI, SEYED JAFAR;GIARRATANO, MICHAEL
发明人
LONG, MAOLIN;LU, RALPH;EGLEY, FRED;ANDERSON, THOMAS;JAFARIAN-TEHRANI, SEYED JAFAR;GIARRATANO, MICHAEL