| 摘要 |
PROBLEM TO BE SOLVED: To provide a multi-beam type charged particle beam application device having a function wherein a primary beam is incident to a sample from a slanting direction without relatively inclining an electrooptic system and the sample. SOLUTION: In the multi-beam type charged particle beam application device, lenses 140a, 140b are controlled by an optical control circuit 139 so as to focus on the sample while lens voltage of an array lens 109 is turned off. The primary beam 107 is irradiated to one point on the sample by a plurality of directions, namely, a plurality of angles against a sample wafer 115, and a reached point of the primary beam 107 on the sample is maintained at a fixed level without inclining the electrooptic system and the sample. Furthermore, an irradiating angle of the primary beam 107 for irradiation to the sample wafer 115 can be selected by individually controlling a blanca array 116 arranged by corresponding to an aperture array 108 and the array lens 109. COPYRIGHT: (C)2009,JPO&INPIT
|
