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发明名称
MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME
摘要
申请公布号
EP2123658(A4)
申请公布日期
2012.02.08
申请号
EP20080711128
申请日期
2008.02.12
申请人
JSR CORPORATION
发明人
NAKAGAWA, HISASHI;NOBE, YOUHEI;KATOU, HITOSHI;ISHIZUKI, KENJI;KOKUBO, TERUKAZU
分类号
C07F7/18;C09D5/25;C09D183/06;C23C16/42;H01L21/316
主分类号
C07F7/18
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