| 摘要 |
<p>PURPOSE: A radiation-sensitive resin composition, a resist pattern forming method, polymer, and compounds are provided to efficiently form resist patterns by improving surface wettability in a short period of time. CONSTITUTION: A radiation-sensitive resin composition includes a fluorine-containing compound and a radiation-sensitive acid generator. The fluorine-containing compound includes a group represented by chemical formula 1. In the chemical formula 1, the RC is p+1-valent aromatic cyclic group which is capable of being substituted. The Q is a linker which is one of monovalent hydrophilic groups except for one hydrogen atom. The RE is C1 to C10 hydrocarbon group which is capable of including hydrogen or fluorine. The p is the integer of 1 to 5. If the p is 2 to 5, a plurality of Qs and REs respectively follows the pre-determined definition. The * is a linkage.</p> |
