| 摘要 |
PURPOSE: A pattern forming method and an organic-based treating solution for the same are provided to reduce the defect density of patterns by specifically defining compositions of the organic-based treating solution. CONSTITUTION: A pattern forming method includes the following: a membrane is formed using a chemically amplified resist composition; the membrane is exposed; and the exposed membrane is treated using an organic-based treating solution. The organic-based treating solution includes an organic solvent of 175 degrees Celsius or more of a standard boiling point. The content of the solvent is 30 mass% or less of the organic-based treating solution. While the treatment of the exposed membrane, the exposed membrane is developed. |
