发明名称 Device and method for producing gas barrier layers
摘要 An arrangement for producing gas tight layers, especially for coating gas porous substrates, comprises a vacuum sputter chamber (30) with at least one target (31,32) made of aluminium, and at least two gas containers (37,38) which are connected to the sputter chamber via at least one gas supply line with a closure. An arrangement for producing gas tight layers, especially for coating gas porous substrates, comprises a vacuum sputter chamber (30) with at least one target (31,32) made of aluminium, and at least two gas containers (37,38) which are connected to the sputter chamber via at least one gas supply line with a closure. The first container holds argon and the second container holds air. The layers are formed by using argon as the sputter gas and oxygen as the reactive gas, and then sputtering the aluminium target. The AlOxNy layer formed is 1-100nm thick and is embedded between two polymer layers.
申请公布号 EP1624086(B1) 申请公布日期 2012.02.08
申请号 EP20040018645 申请日期 2004.08.06
申请人 APPLIED MATERIALS GMBH & CO. KG 发明人 HEGEMANN, THOMAS;SOMMER, ELISABETH
分类号 C23C14/00;C23C14/02;C23C14/06;H01J37/32 主分类号 C23C14/00
代理机构 代理人
主权项
地址