发明名称 Method to form a recess for a microfluidic device
摘要 A method includes forming a recess in a first surface of a substrate, the recess having a width, depth, and height selected to correspond to a width, depth, and height of a fluid chamber, forming a sacrificial material in the recess, forming a first heater element, forming a metal layer overlying the first heater element, and forming a nozzle opening in the metal layer to expose the sacrificial material. The method also includes forming a path from a second surface of the substrate to expose the sacrificial material and removing the sacrificial material from the recess to expose the chamber with the selected width, depth, and height, the chamber in fluid communication with the path, the nozzle opening, and a surrounding environment.
申请公布号 US8110117(B2) 申请公布日期 2012.02.07
申请号 US20090422732 申请日期 2009.04.13
申请人 WANG FUCHAO;FANG MING;STMICROELECTRONICS, INC. 发明人 WANG FUCHAO;FANG MING
分类号 B44C1/22 主分类号 B44C1/22
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