发明名称 Surface position detecting apparatus, surface position detecting method, exposure apparatus, and device manufacturing method
摘要 A surface position detecting apparatus which detects position information of a predetermined surface in an object, comprising a first optical system which projects light from an oblique direction to the predetermined surface; a second optical system which receives the light from the object; a detecting system which receives the light from the second optical system and which detects the position information of the predetermined surface in a direction intersecting the predetermined surface based on the light; and a phase difference imparting system which is arranged in an optical path of at least one of the first and second optical systems and which imparts a phase difference between different portions from each other of light traveling via a surface other than the predetermined surface in the object, in the light from the second optical system.
申请公布号 US8111406(B2) 申请公布日期 2012.02.07
申请号 US20080265572 申请日期 2008.11.05
申请人 HIDAKA YASUHIRO;NIKON CORPORATION 发明人 HIDAKA YASUHIRO
分类号 G01B11/14 主分类号 G01B11/14
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