发明名称 Imprint device and microstructure transfer method
摘要 There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.
申请公布号 US8109751(B2) 申请公布日期 2012.02.07
申请号 US20070774244 申请日期 2007.07.06
申请人 ANDO TAKASHI;KOMORIYA SUSUMU;OGINO MASAHIKO;MIYAUCHI AKIHIRO;HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ANDO TAKASHI;KOMORIYA SUSUMU;OGINO MASAHIKO;MIYAUCHI AKIHIRO
分类号 B28B11/08 主分类号 B28B11/08
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