| 摘要 |
PURPOSE: A cleaning apparatus and a cleaning method thereof are provided to prevent defocus by reducing the influence of a fine convex part on a backside of a wafer. CONSTITUTION: A wafer maintenance and support part(2) fits and supports an outer circumference of a wafer(10). A wafer rotation driving part(3) horizontally rotates the wafer maintenance and support part at the arbitrary number of rotation. A brush(4) serves for removing a foreign material on the wafer and the convex part. A brush driving part(5) lifts the brush to an arbitrary height. A controlling part(8) controls the wafer rotation driving part, the brush driving part, a sensor part(6), and a sensor driving part(7).
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