发明名称 ELECTRODE FOR ELECTROSTATIC ATTRACTION AND SUBSTRATE PROCESSING APPARATUS
摘要 PURPOSE: An electrostatic adsorption electrode and a substrate processing apparatus are provided to obtain high adhesion without any problem on a withstand voltage performance by forming an insulating film by thermal spraying. CONSTITUTION: A board mounting table for mounting a glass substrate(G) is arranged in a bottom part in a process chamber(2). An electrostatic chuck(6) is arranged on a convex part(5a) of a material(5). The electrostatic chuck includes a ceramic spraying film(41), a first metal electrode layer(42a), and a second metal electrode layer(42b). A frame-shaped sealed ring(7) is arranged around the electrostatic chuck and the convex part of the material. A lift pin(10) loads and unloads the glass substrate. A feeder(12) for supplying high frequency power is connected to the material.
申请公布号 KR20120011091(A) 申请公布日期 2012.02.06
申请号 KR20120004806 申请日期 2012.01.16
申请人 TOKYO ELECTRON LIMITED 发明人 SASAKI YOSHIHIKO;MINAMI MASATO;FURUYA ATSUKI
分类号 H01L21/683 主分类号 H01L21/683
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