发明名称 |
Graphene Synthesis Chamber And Method for Synthesizing Graphene Using The Same |
摘要 |
<p>PURPOSE: A graphene synthesizing chamber and a graphene synthesizing method using the same are provided to effectively suppress pollutants from being deposited on the inner and lateral side of the chamber by depositing the pollutants on a filter and exchanging the filter. CONSTITUTION: A graphene synthesizing chamber(2) includes an internal space(102) with the loading space(H) of a metal thin plate. A container part(100) with a first inlet(155) is arranged in the internal space. A heating part(200) heats heat to the loading space. A first filter(300) is arranged between the loading space and the first inlet and includes a first filter with a plurality of through holes. A method for synthesizing graphene includes the following: the metal thin plate is loaded in the loading space; the pressure of the internal space is reduced; hydrogen gas is injected into the internal space; heat is applied to the loading space; and hydrocarbon gas is injected into the first inlet.</p> |
申请公布号 |
KR20120010667(A) |
申请公布日期 |
2012.02.06 |
申请号 |
KR20100071606 |
申请日期 |
2010.07.23 |
申请人 |
SAMSUNG TECHWIN CO., LTD. |
发明人 |
CHO, SEUNG MIN;WON, DONG KWAN |
分类号 |
C01B31/02;C23C16/26;C23C16/455;C23C16/46 |
主分类号 |
C01B31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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