PERIPHERAL EXPOSURE APPARATUS, PERIPHERAL EXPOSURE METHOD, PROGRAM, COMPUTER STORAGE MEDIUM

摘要

The object of the present invention is to carry out a dummy shot suitably by using a peripheral exposure apparatus. The present invention provides a peripheral exposure apparatus (42) which exposes the surrounding edge portion of a wafer coated with a resist film. The peripheral exposure apparatus comprises: an imaging section for imaging the surface of a wafer (W); a wafer chuck for holding the wafer (W); an exposure section (130) for exposing the surrounding edge portion of the wafer retained in the wafer chuck; a chuck driving section for moving and rotating the wafer chuck; an exposure driving section for moving the exposure section (130); and a control section (200) for acquiring the arrangement information of a shot of the pattern on the wafer (W) and controlling the chuck driving section and exposure driving section so that the surrounding edge portion of the wafer (W) is exposed based on the arrangement information.