| 摘要 |
<P>PROBLEM TO BE SOLVED: To match the distribution of integral exposure amount in the scanning direction to a target distribution with high accuracy when an article to be exposed is subjected to scanning exposure. <P>SOLUTION: The method of operating the exposure amount when a wafer W is subjected to scanning exposure by moving a pulse illumination light IL and the wafer W relatively includes a step for representing the target integral exposure amount of the wafer W by a first polynominal of m-order (m is an integer of 1 or more) with regard to the position x of the wafer W in the scanning direction, and a step of determining the coefficients of a second polynominal which represent the target pulse energy of the pulse illumination light IL as a function of the position x by using the coefficients of the first polynominal. <P>COPYRIGHT: (C)2012,JPO&INPIT |
