| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique relating to the field of correcting errors of a photolithographic mask. <P>SOLUTION: A method for correcting a plurality of errors of a photolithographic mask comprises: a step of optimizing first parameters of an imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask and; a step of correcting the plurality of errors by applying an imaging transformation using the optimized first parameters and locally directing the laser beam onto the photolithographic mask using the optimized second parameters, wherein the first and the second parameters are simultaneously optimized in a joint optimization process. <P>COPYRIGHT: (C)2012,JPO&INPIT |
