发明名称 METHOD FOR CORRECTING DEFECT OF TEMPLATE, METHOD FOR MAKING TEMPLATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for correcting a defect of a template that can easily correct a white defect even if a pattern is miniaturized. <P>SOLUTION: The method for correcting a defect of a template includes a step S3 for making a second template for imprint using a first template for imprint including a white defect and a step S5 for correcting a black defect of the second template. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012023109(A) 申请公布日期 2012.02.02
申请号 JP20100158218 申请日期 2010.07.12
申请人 TOSHIBA CORP 发明人 MORISHITA YOSHIKO;HIRANO TAKASHI;ASANO MASASHI
分类号 H01L21/027 主分类号 H01L21/027
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