发明名称 |
METHOD FOR CORRECTING DEFECT OF TEMPLATE, METHOD FOR MAKING TEMPLATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for correcting a defect of a template that can easily correct a white defect even if a pattern is miniaturized. <P>SOLUTION: The method for correcting a defect of a template includes a step S3 for making a second template for imprint using a first template for imprint including a white defect and a step S5 for correcting a black defect of the second template. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012023109(A) |
申请公布日期 |
2012.02.02 |
申请号 |
JP20100158218 |
申请日期 |
2010.07.12 |
申请人 |
TOSHIBA CORP |
发明人 |
MORISHITA YOSHIKO;HIRANO TAKASHI;ASANO MASASHI |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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