发明名称 ELECTRODE STUCTURE, SEMICONDUCTOR ELEMENT, AND METHODS OF MANUFACTURING THE SAME
摘要 According to the present invention, there is provided an electrode structure which includes: a nitride semiconductor layer; an electrode provided over the nitride semiconductor layer; and an electrode protective film provided over the electrode, wherein the nitride semiconductor layer contains a metal nitride containing Nb, Hf or Zr as a constitutive element, the electrode has a portion having a metal oxide containing Ti or V as a constitutive element formed therein, and the electrode protective film covers at least a portion of the electrode, and contains a protective layer having Au or Pt as a constitutive element.
申请公布号 US2012028456(A1) 申请公布日期 2012.02.02
申请号 US201113269153 申请日期 2011.10.07
申请人 KOUMOTO SHIGERU;SASAKI TATSUYA;SHIBA KAZUHIRO;SUMINO MASAYOSHI;RENESAS ELECTRONICS CORPORATION 发明人 KOUMOTO SHIGERU;SASAKI TATSUYA;SHIBA KAZUHIRO;SUMINO MASAYOSHI
分类号 H01L21/28;H01L33/32;H01L33/40 主分类号 H01L21/28
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