发明名称 OPTICAL SYSTEM FOR DETECTING ABNORMALITY AND/OR FEATURE OF SURFACE
摘要 <P>PROBLEM TO BE SOLVED: To provide an improved surface inspection system which is used for purposes in a wider range in an optical apparatus for detecting abnormality of a sample and of which the sensitivity and performance are improved. <P>SOLUTION: The optical apparatus having a slender shape includes: a first optical device 12 for focusing radiation light to focused light at a certain incident angle on an illuminated area on the surface of a sample 18; a first detector array 32; and a condensing optical device 30 for condensing radiation light generated from first light 16 and scattered from the illuminated area 20 on the sample surface and focusing the radiation light condensed and scattered from a part of the illuminated area to a corresponding detector in the first detector array 32. The first optical device 12 has a reflector 106 on a condensing aperture of the condensing optical device 30 for reflecting light to the surface of the sample, and the reflector 106 reduces interference on the condensing aperture of the condensing optical device 30. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012021994(A) 申请公布日期 2012.02.02
申请号 JP20110166568 申请日期 2011.07.29
申请人 KLA-ENCOR CORP 发明人 ISABELLA LEWIS;WEISS IRAVANI MEDI
分类号 G01N21/956;G01N21/47;G01N21/88;G01N21/94;G01N21/95;H01L21/66 主分类号 G01N21/956
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