发明名称 |
POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS |
摘要 |
A polymer is provided comprising recurring units having a N,N′-bis(alkoxymethyl)tetrahydropyrimidinone or N,N′-bis(hydroxymethyl)tetrahydropyrimidinone structure on a side chain. When a chemically amplified negative resist composition is formulated using the polymer and processed by lithography, a fine resist pattern can be formed with the advantages of improved LER and high resolution.
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申请公布号 |
US2012028190(A1) |
申请公布日期 |
2012.02.02 |
申请号 |
US201113192297 |
申请日期 |
2011.07.27 |
申请人 |
MASUNAGA KEIICHI;WATANABE SATOSHI;TANAKA AKINOBU;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
MASUNAGA KEIICHI;WATANABE SATOSHI;TANAKA AKINOBU |
分类号 |
G03F7/038;C08F26/06;G03F7/32 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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