发明名称 DICING TAPE-INTEGRATED FILM FOR SEMICONDUCTOR BACK SURFACE, AND PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE
摘要 The present invention relates to a dicing tape-integrated film for semiconductor back surface, which includes: a dicing tape including a base material layer, a first pressure-sensitive adhesive layer and a second pressure-sensitive adhesive layer stacked in this order, and a film for semiconductor back surface stacked on the second pressure-sensitive adhesive layer of the dicing tape, in which a peel strength Y between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer is larger than a peel strength X between the second pressure-sensitive adhesive layer and the film for semiconductor back surface, and in which the peel strength X is from 0.01 to 0.2 N/20 mm, and the peel strength Y is from 0.2 to 10 N/20 mm.
申请公布号 US2012028418(A1) 申请公布日期 2012.02.02
申请号 US201113191697 申请日期 2011.07.27
申请人 ASAI FUMITERU;SHIGA GOJI;TAKAMOTO NAOHIDE;NITTO DENKO CORPORATION 发明人 ASAI FUMITERU;SHIGA GOJI;TAKAMOTO NAOHIDE
分类号 H01L21/78;B32B33/00 主分类号 H01L21/78
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