发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING ACID DIFFUSION
摘要 A method of manufacturing a semiconductor device includes forming a resist pattern on a first region on a substrate, bringing a descum solution including an acid source into contact with the resist pattern and with a second region of the substrate, decomposing resist residues remaining on the second region of the substrate by using acid obtained from the acid source in the descum solution and removing the decomposed resist residues and the descum solution from the substrate.
申请公布号 US2012028434(A1) 申请公布日期 2012.02.02
申请号 US201113185897 申请日期 2011.07.19
申请人 LEE HYUNG-RAE;KANG YOOL;YOON KYUNG-HWAN;KIM HYOUNG-HEE;HAN SO-RA;PARK TAE-HOI 发明人 LEE HYUNG-RAE;KANG YOOL;YOON KYUNG-HWAN;KIM HYOUNG-HEE;HAN SO-RA;PARK TAE-HOI
分类号 H01L21/306;H01L21/76 主分类号 H01L21/306
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