REFLECTIVE MASK BLANK, MANUFACTURING METHOD THEREOF, AND REFLECTIVE MASK

摘要

[Problem] To resolve the problem that employing high-contrast photoresist that is typically used when producing a reflective mask causes accumulated energy and CD linearity to deteriorate owing to backscatter. [Solution] A reflective mask blank for producing a reflective mask comprises: a substrate; a multilayered reflecting film that is formed on the substrate and that reflects exposure light; and an absorbing body film, formed on the multilayered reflecting film, which absorbs exposure light. A photoresist film for electron beam etching is disposed on the absorbing body film, and the contrast ? of the photoresist film for electron beam etching is 30 or less.