| 摘要 |
<p>[Problem] A sintered material for a ZnO-MgO-based sputtering target, which comprises ZnO and MgO, and which is characterized in that Mg is contained in an amount of 3-50 mol% in terms of MgO, an MgO phase (containing an MgO-rich solid solution phase) has the largest crystal particle diameter of 10 µm or less, and the sintered material has a homogeneously dispersed structure. The purpose of the present invention is to provide a sintered material for a ZnO-MgO-based sputtering target, which rarely undergoes the formation of nodules or particles even when the sputtering is carried out for a long period, and which enables the production of a film of which the film composition has excellent in-plane uniformity.</p> |
