发明名称 |
RADIATION SOURCE APPARATUS AND DUV BEAM GENERATION METHOD |
摘要 |
The present invention provides a radiation source apparatus which can generate a DUV radiation beam having a wavelength of 193.4 nm efficiently. The radiation source apparatus according to the invention has first wavelength conversion means arranged to receive a first laser beam of a first fundamental wavelength and to generate a fourth-harmonic wavelength of the first fundamental wavelength, second wavelength conversion means arranged to receive the beam of the fourth-harmonic wavelength of the first fundamental wavelength (266 nm) and a second laser beam of a second fundamental wavelength and to sum-frequency mix the fourth-harmonic with the second fundamental wavelength radiation to generate a beam of second DUV radiation having a wavelength between approximately 232 nm and 237 nm, and third wavelength conversion means arranged to receive the beam of second DUV radiation and the third laser beam of a third fundamental wavelength and to sum-frequency mix the second DUV radiation with the third fundamental wavelength radiation to generate third DUV radiation having a wavelength between approximately 192.5 nm and 194.5 nm.
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申请公布号 |
US2012026578(A1) |
申请公布日期 |
2012.02.02 |
申请号 |
US201113075797 |
申请日期 |
2011.03.30 |
申请人 |
SAKUMA JUN;LASERTEC CORPORATION |
发明人 |
SAKUMA JUN |
分类号 |
G02F1/355;G02F1/35;G02F1/37;G03F1/84;H01S3/109 |
主分类号 |
G02F1/355 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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