| 发明名称 |
RETICLE CHUCK CLEANER |
| 摘要 |
According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate. |
| 申请公布号 |
US2012024318(A1) |
申请公布日期 |
2012.02.02 |
| 申请号 |
US201113192694 |
申请日期 |
2011.07.28 |
| 申请人 |
ITOH MASAMITSU;OKUMURA KATSUYA;INADA TARO;WATANABE JUN |
发明人 |
ITOH MASAMITSU;OKUMURA KATSUYA;INADA TARO;WATANABE JUN |
| 分类号 |
B08B7/00;B05D5/06;B05D5/10;B05D5/12 |
主分类号 |
B08B7/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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