| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a nanochannel device having embedded nanochannels or nanopores with pore width or channel width of less than 1 micron and more preferably less than 10 nm and length of a micron range or longer than the micron range. <P>SOLUTION: In a method of manufacturing a nanochannel device, the device comprises; a mono-crystalline substrate 1 having at least one recessed region 4 which exposes predetermined crystallographic planes of the mono-crystalline substrate 1, the at least one recessed region 4 further has a recess width; a filling material 5; and an embedded nanochannel 6, in which the width, the shape, and the depth of the embedded nanochannel 6 is determined by the recess width of the at least one recessed region 4 and by the growth rate of the growth front of the filling material in a direction perpendicular to the exposed predetermined crystallographic planes. <P>COPYRIGHT: (C)2012,JPO&INPIT |
