ACTINIC RAY SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition that can satisfy both excellent developing property and excellent followability of immersion liquid and to provide a method for forming pattern using the composition.

SOLUTION: An actinic ray sensitive or radiation sensitive resin composition according to the present invention is a resin (B) having at least one of fluorine atom and silicon atom and includes a resin (B) including a repeating unit expressed by the following formula (I); a resin (A) whose solubility in an alkali developing solution is increased by an action of an acid; and a compound which generates an acid upon irradiation with actinic ray or radiation.

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