发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING LEAD FRAME, PRINTED WIRING BOARD, AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 <p>Disclosed is a photosensitive resin composition which is configured to contain: a binder polymer that has a constituent unit derived from a (meth)acrylic acid and a constituent unit derived from a benzyl (meth)acrylate or a benzyl (meth)acrylate derivative; a polymerizable compound that has at least one ethylenically unsaturated bond; and a photopolymerization initiator that contains an acylphosphine oxide compound and a hexaaryl biimidazole derivative.</p>
申请公布号 WO2012014580(A1) 申请公布日期 2012.02.02
申请号 WO2011JP63389 申请日期 2011.06.10
申请人 HITACHI CHEMICAL COMPANY, LTD.;IWASHITA, KENICHI;KUSHIDA, MASATAKA 发明人 IWASHITA, KENICHI;KUSHIDA, MASATAKA
分类号 G03F7/029;C08F2/44;C08F2/50;G03F7/004;G03F7/033;H05K3/06;H05K3/18 主分类号 G03F7/029
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