发明名称 LIQUID RECOVERY APPARATUS, EXPOSURE DEVICE, LIQUID RECOVERY METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To provide a liquid recovery apparatus, an exposure device, and a liquid recovery method, which recover liquid in a desired state and suppress the occurence of exposure defects. <P>SOLUTION: A liquid recovery apparatus is used in an immersion exposure device and connects with an immersion member 3 arranged in at least a part of an area around an optical path of exposure light passing through an optical member and liquid between the optical member and an object. The liquid recovery apparatus 6 connects with a discharge part of the immersion member 3, which separates liquid from gas in a recovery path 31 of the immersion member 3, in which the liquid recovered through a recovery port of the immersion member 3 flows, and discharges the liquid and the gas. The liquid recovery apparatus 6 includes a first flow passage 61 into which the liquid discharged from a first discharge port 41 of the discharge part flows and a second flow passage 62 into which the gas discharged from a second discharge port 42 of the discharge part flows, and a first detection device 71 arranged in at least a part of the second flow passage 62 and detecting the amount of the gas discharged from the second discharge port 42. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012023379(A) 申请公布日期 2012.02.02
申请号 JP20110155869 申请日期 2011.07.14
申请人 NIKON CORP 发明人 HOSHINO YUI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
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