发明名称 |
SYSTEMS AND METHODS FOR HIGH-RATE DEPOSITION OF THIN FILM LAYERS ON PHOTOVOLTAIC MODULE SUBSTRATES |
摘要 |
Apparatus and processes for sequential sputtering deposition of a target source material as a thin film on a photovoltaic module substrate are provided. The apparatus includes a first sputtering deposition chamber and a second sputtering deposition chamber that are integrally connected such that the substrates being transported through the apparatus are kept at a system pressure that is less than about 760 Torr. The load vacuum chamber is connected to a load vacuum pump configured to reduce the pressure within the load vacuum chamber to an initial load pressure. The first sputtering deposition chamber includes a first target, and the second sputtering deposition chamber includes a second target. A conveyor system is operably disposed within the apparatus and configured for transporting substrates in a serial arrangement into and through load vacuum chamber, into and through the first sputtering deposition chamber, and into and through the second sputtering deposition chamber at a controlled speed.
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申请公布号 |
US2012024695(A1) |
申请公布日期 |
2012.02.02 |
申请号 |
US201113047189 |
申请日期 |
2011.03.14 |
申请人 |
BLACK RUSSELL WELDON;PRIMESTAR SOLAR, INC. |
发明人 |
BLACK RUSSELL WELDON |
分类号 |
C23C14/34;C23C14/14;C23C14/35;C23C14/38 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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地址 |
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