Exposure apparatus and exposure method using the same

摘要

PURPOSE: An exposing apparatus and an exposing method using the same are provided to prevent the occurrence of stains on an exposed region in case of exposure. CONSTITUTION: An exposing apparatus includes a light source part(100), a substrate stage part(400), and a prism part(200). The light source part irradiates light. The substrate stage part supports a substrate(10) including an exposed region and a non-exposed region. The prism part is arranged between the light source part and the substrate stage part. The prism part transmits light to be irradiated to the exposed region and blocks light not to be irradiated to the non-exposed region. The prism part includes a first prism with a first plane and a second plane and a second prism with a third plane. Light enters the first plane and is reflected from or transmitted through the second plane. The second prism is separated from the first prism, and the third plane of the second prism is in parallel with the second plane of the first prism.