发明名称 A Method for Eliminating a Dislocation in Growing Single Si Crystal
摘要 PURPOSE: A method for manufacturing dislocation-free single crystal silicon is provided to grow the dislocation-free single crystal silicon to a large capacity and diameter without a necking by suppressing dislocation due to improper seed location. CONSTITUTION: Single crystal silicon is made by immersing a seed crystal in a crucible with silicon solution and pulling out the seed crystal. The dislocation-free single crystal silicon is separated from the silicon solution without necking. The crucible rotates at 5 to 20 rpm.
申请公布号 KR20120008617(A) 申请公布日期 2012.02.01
申请号 KR20100069452 申请日期 2010.07.19
申请人 NEXOLON CO., LTD. 发明人 LIM, JI WON;KIM, JEONG SEOK;KIM, SOON IL;HEO, WON SEOK;JANG, JUNG GIL
分类号 C30B15/04;C30B29/06 主分类号 C30B15/04
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