A Method for Eliminating a Dislocation in Growing Single Si Crystal
摘要
PURPOSE: A method for manufacturing dislocation-free single crystal silicon is provided to grow the dislocation-free single crystal silicon to a large capacity and diameter without a necking by suppressing dislocation due to improper seed location. CONSTITUTION: Single crystal silicon is made by immersing a seed crystal in a crucible with silicon solution and pulling out the seed crystal. The dislocation-free single crystal silicon is separated from the silicon solution without necking. The crucible rotates at 5 to 20 rpm.
申请公布号
KR20120008617(A)
申请公布日期
2012.02.01
申请号
KR20100069452
申请日期
2010.07.19
申请人
NEXOLON CO., LTD.
发明人
LIM, JI WON;KIM, JEONG SEOK;KIM, SOON IL;HEO, WON SEOK;JANG, JUNG GIL