发明名称 |
Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
摘要 |
<p>Sulfonate salts have the formula: CF 3 -CH(OH)-CF 2 SO 3 - M + wherein M + is a Li, Na, K, ammonium or tetramethylammonium ion. Because of inclusion within the molecule of a hydroxyl group which is a polar group, the sulfonic acids are effective for restraining the length of acid diffusion through hydrogen bond or the like. The photoacid generators that generate these sulfonic acids perform well during the device fabrication process including coating, pre-baking, exposure, post-exposure baking, and developing steps. The photoacid generators are little affected by water left on the wafer during the ArF immersion lithography.</p> |
申请公布号 |
EP1780199(B1) |
申请公布日期 |
2012.02.01 |
申请号 |
EP20060255508 |
申请日期 |
2006.10.26 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KOBAYASHI, KATSUHIRO.;OHSAWA, YOUICHI;KINSHO, TAKESHI;WATANABE, TAKERU;OHASHI, MASAKI |
分类号 |
C07C309/08;G03F7/004 |
主分类号 |
C07C309/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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