METHOD OF FORMING A PROTECTIVE LAYER ON THIN-FILM PHOTOVOLTAIC ARTICLES AND ARTICLES MADE WITH SUCH A LAYER

摘要

Chalcogenide based photovoltaic devices cells with good resistance to environmental elements can be formed by direct low temperature deposition of inorganic barrier layers onto the film. A unique multilayer barrier can be formed in a single step when reactive sputtering of the silicon nitride onto an inorganic oxide top layer of the PV device.