发明名称 MOSFET AND METHOD FOR MANUFACTURING MOSFET
摘要 <p>A MOSFET 1 includes: a silicon carbide (SiC) substrate (2) having a main surface having an off angle of not less than 50° and not more than 65° relative to a {0001} plane; a semiconductor layer (21) formed on the main surface of the SiC substrate (2); and an insulating film (26) formed in contact with a surface of the semiconductor layer (21). The MOSFET 1 has a sub-threshold slope of not more than 0.4 V/Decade.</p>
申请公布号 EP2413364(A1) 申请公布日期 2012.02.01
申请号 EP20100756048 申请日期 2010.03.23
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 WADA, KEIJI;HARADA, SHIN;MASUDA, TAKEYOSHI;HONAGA, MISAKO
分类号 H01L29/78;H01L21/336;H01L29/04;H01L29/16 主分类号 H01L29/78
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