发明名称 |
Semiconductor process chamber |
摘要 |
A process chamber 10 comprising a container (12), a lid (14), and a sealed interface (16) therebetween. The container's interface surface (30) and/or the lid's interface surface (32) includes at least one groove (36) in which a seal (40) is situated. The seal (40) comprises an elastomeric element (50) and a metallic element (60). The elastomeric element (50) and the metallic element (60) can be arranged and adapted to seal the chamber's interface (16) sequentially during its conversion to a sealed condition. And/or the elastomeric element (50) and the metallic element (60) can be arranged and adapted to seal the chamber's interface in series once the lid (14) is in its sealed condition.
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申请公布号 |
US8104770(B2) |
申请公布日期 |
2012.01.31 |
申请号 |
US20080024187 |
申请日期 |
2008.02.01 |
申请人 |
DATTA AMITAVA;AMOS PETER G.;MORE DOMINICK G.;CORNETT KENNETH W.;PAYNE JEREMY;PARKER-HANNIFIN CORPORATION |
发明人 |
DATTA AMITAVA;AMOS PETER G.;MORE DOMINICK G.;CORNETT KENNETH W.;PAYNE JEREMY |
分类号 |
F16J15/10 |
主分类号 |
F16J15/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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