发明名称 |
Method for forming porous insulation film |
摘要 |
A method of forming a porous film on a processing target includes: forming fine organic particles by polymerizing an organic compound in a gaseous phase; mixing the fine organic particles with a silicon compound containing a Si—O bond in a gaseous phase, thereby depositing a film containing the fine particles on the processing target; and removing the fine organic particles from the film. |
申请公布号 |
US8105661(B2) |
申请公布日期 |
2012.01.31 |
申请号 |
US20060559797 |
申请日期 |
2006.11.14 |
申请人 |
HYODO YASUYOSHI;KOHMURA KAZUO;FUJII NOBUTOSHI;KUNIMI NOBUTAKA;KINOSHITA KEIZO;ASM JAPAN K.K.;ULVAC, INC.;NEC CORPORATION |
发明人 |
HYODO YASUYOSHI;KOHMURA KAZUO;FUJII NOBUTOSHI;KUNIMI NOBUTAKA;KINOSHITA KEIZO |
分类号 |
H05H1/24 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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