发明名称 Method for forming porous insulation film
摘要 A method of forming a porous film on a processing target includes: forming fine organic particles by polymerizing an organic compound in a gaseous phase; mixing the fine organic particles with a silicon compound containing a Si—O bond in a gaseous phase, thereby depositing a film containing the fine particles on the processing target; and removing the fine organic particles from the film.
申请公布号 US8105661(B2) 申请公布日期 2012.01.31
申请号 US20060559797 申请日期 2006.11.14
申请人 HYODO YASUYOSHI;KOHMURA KAZUO;FUJII NOBUTOSHI;KUNIMI NOBUTAKA;KINOSHITA KEIZO;ASM JAPAN K.K.;ULVAC, INC.;NEC CORPORATION 发明人 HYODO YASUYOSHI;KOHMURA KAZUO;FUJII NOBUTOSHI;KUNIMI NOBUTAKA;KINOSHITA KEIZO
分类号 H05H1/24 主分类号 H05H1/24
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