发明名称 Methods of forming capacitors
摘要 A method of forming a capacitor includes forming a conductive first capacitor electrode material comprising TiN over a substrate. TiN of the TiN-comprising material is oxidized effective to form conductive TiOxNy having resistivity no greater than 1 ohm·cm over the TiN-comprising material where x is greater than 0 and y is from 0 to 1.4. A capacitor dielectric is formed over the conductive TiOxNy. Conductive second capacitor electrode material is formed over the capacitor dielectric. Other aspects and implementations are contemplated, including capacitors independent of method of fabrication.
申请公布号 US8105896(B2) 申请公布日期 2012.01.31
申请号 US20090480496 申请日期 2009.06.08
申请人 BHAT VISHWANATH;ROCKLEIN NOEL;GEALY F. DANIEL;MICRON TECHNOLOGY, INC. 发明人 BHAT VISHWANATH;ROCKLEIN NOEL;GEALY F. DANIEL
分类号 H01L21/8242 主分类号 H01L21/8242
代理机构 代理人
主权项
地址