发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
A lithographic apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a sensor array positioned and arranged to detect an acoustic wave from a movable part of the lithographic apparatus, a controller, the controller having a controller input connected to the sensor array so as to receive a sensor array output signal, and a controller output connected to at least one actuator arranged to act on the movable part, the controller being arranged to: calculate a movement of the movable part from the sensor array output signal, and drive via the controller output the at least one actuator in response to the calculated movement. |
申请公布号 |
NL2007036(A) |
申请公布日期 |
2012.01.31 |
申请号 |
NL20112007036 |
申请日期 |
2011.07.04 |
申请人 |
ASML NETHERLANDS B.V.;TU EINDHOVEN;SORAMA, |
发明人 |
AANGENENT, WOUTER;VERMEULEN, JOHANNES;BEERENS, RUUD;SCHOLTE, RICK;LOPEZ ARTEAGA, INES |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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