发明名称 Sputtering target for optical media, method of manufacturing same, optical medium, and method of manufacturing same
摘要 A sputtering target for optical media is mainly composed of Al and contains 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag. An optical medium 100 comprises a substrate 10 and reflective layers 20A, 20B provided on the substrate 10. Each of the reflective layers 20A, 20B has a composition, mainly composed of Al, containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.
申请公布号 US8105673(B2) 申请公布日期 2012.01.31
申请号 US20090555349 申请日期 2009.09.08
申请人 KAWAGUCHI YUKIO;KURIBAYASHI ISAMU;TDK CORPORATION 发明人 KAWAGUCHI YUKIO;KURIBAYASHI ISAMU
分类号 B32B3/02 主分类号 B32B3/02
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