发明名称 |
Sputtering target for optical media, method of manufacturing same, optical medium, and method of manufacturing same |
摘要 |
A sputtering target for optical media is mainly composed of Al and contains 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag. An optical medium 100 comprises a substrate 10 and reflective layers 20A, 20B provided on the substrate 10. Each of the reflective layers 20A, 20B has a composition, mainly composed of Al, containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag. |
申请公布号 |
US8105673(B2) |
申请公布日期 |
2012.01.31 |
申请号 |
US20090555349 |
申请日期 |
2009.09.08 |
申请人 |
KAWAGUCHI YUKIO;KURIBAYASHI ISAMU;TDK CORPORATION |
发明人 |
KAWAGUCHI YUKIO;KURIBAYASHI ISAMU |
分类号 |
B32B3/02 |
主分类号 |
B32B3/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|