APPARATUS TO IMPROVE WAFER TEMPERATURE UNIFORMITY FOR FACE-UP WET PROCESSING,申请号KR20067008592-传众专利搜索

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发明名称	APPARATUS TO IMPROVE WAFER TEMPERATURE UNIFORMITY FOR FACE-UP WET PROCESSING
摘要
申请公布号	KR101109299(B1)	申请公布日期	2012.01.31
申请号	KR20067008592	申请日期	2004.10.05
申请人		发明人
分类号	H01L21/20;C23C18/16;H01L21/00;H01L21/288	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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