| 发明名称 |
A NOVEL COATING HAVING REDUCED STRESS AND A METHOD OF DEPOSITING THE COATING ON A SUBSTRATE |
| 摘要 |
<p>The present invention is directed to a process for producing an image on a substrate and a substrate having an image deposited thereon using the aforementioned processes.</p> |
| 申请公布号 |
SG177183(A1) |
申请公布日期 |
2012.01.30 |
| 申请号 |
SG20110089869 |
申请日期 |
2009.06.09 |
| 申请人 |
NANOFILM TECHNOLOGIES INTERNATIONAL PTE LTD |
发明人 |
SHI, XU |
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