发明名称 |
A SENSOR AND METHOD FOR FABRICATING THE SAME |
摘要 |
<p>A sensor and method for fabricating a sensor is disclosed that in one embodiment bonds an etched semiconductor substrate wafer (300) to an etched first device wafer (100) comprising a silicon on insulator wafer which is then bonded to a second device wafer (200) comprising a silicon on insulator wafer to create a vented, suspended structure, the flexure of which is sensed by an embedded sensing element (140) to measure differential pressure. In one embodiment, interconnect channels (400) embedded in the sensor facilitate streamlined packaging of the device while accommodating interconnectivity with other devices.Figure 1.</p> |
申请公布号 |
SG177086(A1) |
申请公布日期 |
2012.01.30 |
申请号 |
SG20110042496 |
申请日期 |
2011.06.10 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
GAMAGE, SISIRA KANKANAM;MANTRAVADI, NARESH VENKATA;KLITZKE, MICHAEL;COOKSON, TERRY LEE |
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