METHOD FOR TREATING A SUBSTRATE

摘要

PURPOSE: A substrate processing method is provided to minimize the dry inferiority of a substrate by efficiently dry the substrate using supercritical fluid. CONSTITUTION: Housing(810) offers a space(811) in which a drying process is processed. A supporting plate(820) is combined with the lower side of a lower body in the inner side of the housing. A substrate(W) is loaded on the upper side of the supporting plate. A heater(830) is located in the inner wall of a upper body(812) and the lower body of the housing. A fluid extract line(850) discharges fluid which remains within the housing during a drying process of the substrate or after the drying process of the substrate.